Development Exposure Tools - List of Manufacturers, Suppliers, Companies and Products | IPROS GMS

Exposure tool for research and development of photoresists

Photo Process Analysis Exposure Device Series

<Main lineup of resist analysis exposure equipment> ■UVES-2000 　(Supports g-line/h-line/i-line/248nm and broad light analysis exposure equipment) ■VUVES-4700i 　(Supports 248nm, 193nm exposure, and 193nm immersion exposure) ■EUVES-7000 　(Equipped with an EUV light source, capable of 13.5nm open frame exposure)